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Solution-Processable Indenofluorenes on Polymer Brush Interlayer: Remarkable N-Channel Field-Effect Transistor Characteristics under Ambient Conditions | ACS Applied Materials & Interfaces
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PDF) Negative-tone molecular glass photoresist for high-resolution electron beam lithography
Solution-Processable Indenofluorenes on Polymer Brush Interlayer: Remarkable N-Channel Field-Effect Transistor Characteristics under Ambient Conditions | ACS Applied Materials & Interfaces
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Poly(2-acrylamidoglycolic acid) (PAGA): Controlled Polymerization Using RAFT and Chelation of Metal Cations | Macromolecules
Architecture of Chiral Poly(phenylacetylene)s: From Compressed/Highly Dynamic to Stretched/Quasi-Static Helices | Journal of the American Chemical Society
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